Regulatory Relief for Certain Stationary Sources to Promote American Chemical Manufacturing Security
Impact Score: 2
Timeline: Compliance deadlines for listed stationary sources under the HON Rule extended by 2 years beyond original deadlines
Summary: The President has exempted certain chemical manufacturing facilities from parts of the EPA’s HON Rule emissions requirements for two additional years, citing the unfeasibility of current technology and national security interests. This exemption supports domestic chemical manufacturing critical to energy, defense, agriculture, and health sectors by allowing continued use of pre-HON Rule standards. It may increase emissions risks and affect environmental research and partnerships, particularly at institutions like Vanderbilt University, while also offering opportunities for innovation in sustainable manufacturing technologies.
Key Actions: Vanderbilt’s Environmental Science and Engineering Department should assess regulatory impacts; Office of Federal Relations must engage policymakers; Research Centers to pursue industry collaborations; School of Law to analyze legal implications.
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